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Electron-stimulated desorption study of hydrogen-exposed aluminum filmsH2 adsorption of evaporated clean and H2-exposed aluminum films is investigated by using the electron-stimulated desorption (ESD) method. A strong H(+)ESD signal is observed on a freshly evaporated aluminum surface which is clean according to previously proposed cleanlines criteria. An increased H(+) yield on H2 exposure is also observed. However, the increasing rate of H(+) emission could be directly correlated with small increases in H2O partial pressure during H2 exposure. It is proposed that the oxidation of aluminum by water vapor and subsequent adsorption of H2 or water is the primary process of the enhanced high H(+) yield during H2 exposure.
Document ID
19840058032
Document Type
Reprint (Version printed in journal)
Authors
Park, CH.
(NASA Ames Research Center Moffett Field, CA, United States)
Bujor, M.
(NASA Ames Research Center; Stanford Joint Institute for Surface and Microstructural Research Moffett Field, CA, United States)
Poppa, H.
(NASA Ames Research Center; Stanford Joint Institute for Surface and Microstructural Research, Moffett Field, CA; CNRS and CNET, Centre de Recherche en Physique de l'Environnement Terrestre et Planetai Loiret, France)
Date Acquired
August 12, 2013
Publication Date
January 1, 1984
Publication Information
Publication: Thin Solid Films
Volume: 113
ISSN: 0040-6090
Subject Category
Inorganic And Physical Chemistry
Funding Number(s)
CONTRACT_GRANT: NCA2-OR-840-102
Distribution Limits
Public
Copyright
Other
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