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A new technique for measuring sputtering yields at high energiesThe use of thin, self-supporting carbon catcher foils allows one to measure sputtering yields in a broad range of materials with high sensitivity. Analyzing the foils with Rutherford forward scattering, sputtered Al, Si and P surface densities down to 5 x 10 to the 13th per sq cm with uncertainties of about 20 percent have been measured.
Document ID
19840062787
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Qiu, Y. (California Institute of Technology, Pasadena, CA; Lanzhou University Lanzhou, People's Republic of China, United States)
Griffith, J. E. (California Institute of Technology, Pasadena, CA; Bell Telephone Laboratories, Inc. Murray Hill, NJ, United States)
Tombrello, T. A. (California Institute of Technology Pasadena, CA, United States)
Date Acquired
August 12, 2013
Publication Date
January 1, 1984
Publication Information
Publication: Nuclear Instruments and Methods in Physics Research
ISSN: 0167-5087
Subject Category
Solid-State Physics
Accession Number
84A45574
Funding Number(s)
CONTRACT_GRANT: NAGW-202
CONTRACT_GRANT: NAGW-148
CONTRACT_GRANT: NSF PHY-79-23638
Distribution Limits
Public
Copyright
Other

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