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Split-cross-bridge resistor for testing for proper fabrication of integrated circuitsAn electrical testing structure and method is described whereby a test structure is fabricated on a large scale integrated circuit wafer along with the circuit components and has a van der Pauw cross resistor in conjunction with a bridge resistor and a split bridge resistor, the latter having two channels each a line width wide, corresponding to the line width of the wafer circuit components, and with the two channels separated by a space equal to the line spacing of the wafer circuit components. The testing structure has associated voltage and current contact pads arranged in a two by four array for conveniently passing currents through the test structure and measuring voltages at appropriate points to calculate the sheet resistance, line width, line spacing, and line pitch of the circuit components on the wafer electrically.
Document ID
19850021875
Acquisition Source
Legacy CDMS
Document Type
Other - Patent
Authors
Buehler, M. G.
(JPL Pasadena, Calif., United States)
Date Acquired
August 12, 2013
Publication Date
May 7, 1985
Subject Category
Electronics And Electrical Engineering
Accession Number
85N30187
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
NASA-CASE-NPO-16021-1|US-PATENT-4,516,071
Patent Application
US-PATENT-APPL-SN-402205
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