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Corrosion behavior of magnetron sputter-deposited (Mo/0.6/Ru/0.4/)82B18 and Mo82B18 amorphous metal filmsAmorphous metallic films of Mo49Ru33B18 and Mo82B18 have been prepared by magnetron sputtering, and their corrosion behavior was investigated and compared with amorphous liquid-quenched Mo49Ru33B18 and crystalline Mo i acidic and basic solutions. Sputtered Mo49Ru33B18 showed lower corrosion rates compared with liquid-quenched Mo49Ru33B18, owing to the superior surface smoothness and uniformity of the former. Amorphous Mo82B18 showed low corrosion rates in both acidic and basic aqueous solutions. Comparison of the corrosion properties of Mo49Ru33B18 with Mo82B18 and Mo demonstrates the roles of the alloys' constituents. Ru significantly extends the passive region to high-anodic potentials, but, at less-anodic potentials, Mo82B18 has the lowest corrosion rate.
Document ID
19850049528
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Williams, R. M. (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Thakoor, A. P. (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Khanna, S. K. (California Institute of Technology, Jet Propulsion Laboratory, Pasadena CA, United States)
Johnson, W. L. (California Institute of Technology Pasadena, CA, United States)
Date Acquired
August 12, 2013
Publication Date
December 1, 1984
Publication Information
Publication: Electrochemical Society, Journal
Volume: 131
ISSN: 0013-4651
Subject Category
Metallic Materials
Accession Number
85A31679
Funding Number(s)
CONTRACT_GRANT: NAS7-918
CONTRACT_GRANT: DE-AI07-80ID-12138
Distribution Limits
Public
Copyright
Other

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