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Record Details

Record 51 of 1197
On the similarity of the bonding in NiS and NiO
External Online Source: doi:10.1016/0301-0104(85)87004-X
Author and Affiliation:
Bauschlicher, C. W., Jr.(NASA Ames Research Center, Moffett Field, CA, United States)
Abstract: The bonding in NiS is found to be quite similar to that in NiO, having an ionic contribution arising from the donation of the Ni 4s electron to the S atom and a covalent component arising from bonds between the Ni 3d and the S 3p. The one-electron d bonds are found to be of equal strength for NiO and NiS, but the two-electron d bonds are weaker for NiS.
Publication Date: Jan 01, 1985
Document ID:
19850053420
(Acquired Nov 28, 1995)
Accession Number: 85A35571
Subject Category: INORGANIC AND PHYSICAL CHEMISTRY
Document Type: Journal Article
Publication Information: Chemical Physics (ISSN 0301-0104); 93; 399-404
Publisher Information: Netherlands
Financial Sponsor: NASA; United States
Organization Source: NASA Ames Research Center; Moffett Field, CA, United States
Description: 6p; In English
Distribution Limits: Unclassified; Publicly available; Unlimited
Rights: Copyright
NASA Terms: ATOMIC STRUCTURE; CHEMICAL BONDS; INORGANIC SULFIDES; NICKEL COMPOUNDS; NICKEL OXIDES; TRANSITION METALS; DIPOLE MOMENTS; LATTICE PARAMETERS; SULFUR
Imprint And Other Notes: Chemical Physics (ISSN 0301-0104), vol. 93, 1985, p. 399-404.
Availability Source: Other Sources
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