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Emitter formation in dendritic web silicon solar cellsThe use of liquid dopants and liquid masks for p-n junction formation in dendritic web solar cells was investigated and found to be equivalent to the use of gaseous dopants and CVD SiO2 masks previously used. This results in a projected cost reduction of 0.02 1980$/Watt for a 25 MW/year production line, and makes possible junction formation processes having a higher throughput than more conventional processes. The effect of a low-energy (0.4 keV) hydrogen ion implant on dendritic web solar cells was also investigated. Such an implant was observed to improve Voc and Jsc substantially. Measurements of internal quantum efficiency suggest that it is the base of the cell, rather than the emitter, which benefits from the hydrogen implant. The diffusion length for electrons in the p-type base increased from 53 microns to 150 microns in one case, with dendritic web cell efficiency being boosted to 15.2 percent. The mechanism by which low-energy hydrogen ions can penetrate deeply into the silicon to effect the observed improvement is not known at this time.
Document ID
19850053495
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Meier, D. L.
(Westinghouse Research and Development Center Pittsburgh, PA, United States)
Rohatgi, A.
(Westinghouse Research and Development Center Pittsburgh, PA, United States)
Campbell, R. B.
(Westinghouse Electric Corp. Pittsburgh, PA, United States)
Alexander, P.
(California Institute of Technology, Jet Propulsion Laboratory, Pasadena CA, United States)
Fonash, S. J.
(Westinghouse Research and Development Center Pittsburgh, PA, United States)
Singh, R.
(Pennsylvania State University University Park, PA, United States)
Date Acquired
August 12, 2013
Publication Date
January 1, 1984
Subject Category
Solid-State Physics
Meeting Information
Meeting: Photovoltaic Specialists Conference
Location: Kissimmee, FL
Start Date: May 1, 1984
End Date: May 4, 1984
Sponsors: IEEE
Accession Number
85A35646
Funding Number(s)
CONTRACT_GRANT: JPL-95509
CONTRACT_GRANT: XB-3-02090-4
Distribution Limits
Public
Copyright
Other

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