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Improvements in Ionized Cluster-Beam DepositionLower temperatures result in higher purity and fewer equipment problems. In cluster-beam deposition, clusters of atoms formed by adiabatic expansion nozzle and with proper nozzle design, expanding vapor cools sufficiently to become supersaturated and form clusters of material deposited. Clusters are ionized and accelerated in electric field and then impacted on substrate where films form. Improved cluster-beam technique useful for deposition of refractory metals.
Document ID
19860000092
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Fitzgerald, D. J.
(Caltech)
Compton, L. E.
(Caltech)
Pawlik, E. V.
(Caltech)
Date Acquired
August 12, 2013
Publication Date
June 1, 1986
Publication Information
Publication: NASA Tech Briefs
Volume: 10
Issue: 1
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
NPO-16518
Accession Number
86B10092
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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