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Ion-Deposited Polished CoatingsPolished, dense, adherent coatings relatively free of imperfections. New process consists of using broad-beam ion source in evacuated chamber to ion-clean rotating surface that allows grazing incidence of ion beam. This sputter cleans off absorbed gases, organic contaminants, and oxides of mirror surface. In addition to cleaning, surface protrusions sputter-etched away. Process particularly adaptable to polishing of various substrates for optical or esthetic purposes.
Document ID
19860000183
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Banks, B. A.
Date Acquired
August 12, 2013
Publication Date
June 1, 1986
Publication Information
Publication: NASA Tech Briefs
Volume: 10
Issue: 2
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
LEW-13545
Accession Number
86B10183
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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