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Sulfone/Ester Polymers Containing Pendent Ethynyl GroupsTwo processes make high-performance polymers resistant to solvents, without compromising mechanical characteristics. Polymers show improved solvent resistance while retaining high toughness, thermoformability, and mechanical performance. Multistep process involves conversion of pendent bromo group to ethynyl group, while direct process involves reacting hydroxy-terminated sulfone oligomers or polymers with stoichiometric amount of 5-(4-ethynylphenoxy) isophthaloyl chloride. Applications for new polymers include adhesives, composite resin matrices, moldings, ultrafiltration membranes, protective coatings, and such electrical insulators as thin films for microelectronic circuitry.
Document ID
19860000331
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Hergenrother, P. M.
Jensen, B. J.
Date Acquired
August 12, 2013
Publication Date
July 1, 1986
Publication Information
Publication: NASA Tech Briefs
Volume: 10
Issue: 4
ISSN: 0145-319X
Subject Category
Materials
Report/Patent Number
LAR-13316
Accession Number
86B10331
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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