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Contact-resistance process cliffSeveral approaches were investigated to obtain a measure of the quality of the contact resistance between metal and a diffused or polysilicon layer. These approaches have included the use of both short and very long contact strings as well as arays of contacts with different sizes to determine the contact resistance process cliff. Results from these approaches are discussed.
Document ID
19860019786
Acquisition Source
Legacy CDMS
Document Type
Other
Authors
Pina, C. A. (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Date Acquired
August 12, 2013
Publication Date
June 1, 1985
Publication Information
Publication: Product Assurance Technology for Custom LSI(VLSI Electronics
Subject Category
Electronics And Electrical Engineering
Accession Number
86N29258
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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