Radical molecule and ion-molecule mechanisms in the polymerization of hydrocarbons and chlorosilanes in R.F. plasmas at low pressures (below 1.0 Torr)The ion-molecule and the radical-molecule mechanisms are responsible for the dissociation of hydrocarbons, and chlorosilane monomers and the formation of polymerized species, respectively, in the plasma state of a RF discharge. In the plasma, of a mixture of monomer with Ar, the rate determining step for both dissociation and polymerization is governed by an ion-molecular type interaction. Additions of H2 or NH3 to the monomer Ar(+) mixture transforms the rate determining step from an ion-molecular interaction to a radical-molecule type interaction for both monomer dissociation and polymerization processes.
Document ID
19860031516
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Avni, R. (NASA Lewis Research Center Cleveland, OH, United States)
Carmi, U. (NASA Lewis Research Center Cleveland, OH, United States)
Inspektor, A. (NASA Lewis Research Center Cleveland, OH, United States)
Rosenthal, I. (Atomic Energy Commission, Negev Nuclear Research Centre Beersheba, Israel)