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uv laser deposition of metal films by photogenerated free radicalsA novel photochemical method for liquid-phase deposition of metal films is described. In the liquid phase deposition scheme, a metal containing compound and a metal-metal bonded carbonyl complex are dissolved together in a polar solvent and the mixture is irradiated using a UV laser. The optical arrangement consists of a HeCd laser which provides 7 mW of power at a wavelength of 325 nm in the TEM(OO) mode. The beam is attenuated and may be expanded to a diameter of 5-20 mm. Experiments with photochemical deposition of silver films onto glass and quartz substrates are described in detail. Mass spectrometric analysis of deposited silver films indicated a deposition rate of about 1 A/s at incident power levels of 0.01 W/sq cm. UV laser-induced copper and palladium films have also been obtained. A black and white photograph showing the silver Van Der Pauw pattern of a solution-deposited film is provided.
Document ID
19860042130
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Montgomery, R. K.
(Cincinnati Univ. OH, United States)
Mantei, T. D.
(Cincinnati, University OH, United States)
Date Acquired
August 12, 2013
Publication Date
February 17, 1986
Publication Information
Publication: Applied Physics Letters
Volume: 48
ISSN: 0003-6951
Subject Category
INORGANIC AND PHYSICAL CHEMISTRY
Distribution Limits
Public
Copyright
Other