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Influence of preadsorbed oxygen on the sign and magnitude of the chemisorption-induced resistance change for H2 adsorption onto Fe filmsMeasurements have been made of the chemisorption-induced resistance change for H2 adsorbed onto Fe film substrates predosed with fixed coverages of chemisorbed oxygen. The measurements were made at temperatures from 295 to 340 K and for estimated oxygen coverages of less than 0.1 monolayers. Two distinct resistance change components were observed in both the adsorption kinetics and the equilibrium isotherms: a positive component which is associated with the adsorption of H2 onto a clean Fe surface, and a negative component which was correlated with the presence of the chemisorbed oxygen. The resistance change isotherms can be fit with a model which assumes that each of the resistance change components result from dissociative chemisorbed hydrogen. Possible mechanisms for the chemisorbed-oxygen-induced negative resistance change are discussed.
Document ID
19860062334
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Shanabarger, M. R. (California, University Santa Barbara, United States)
Date Acquired
August 12, 2013
Publication Date
June 1, 1986
Publication Information
Publication: Journal of Vacuum Science and Technology A
Volume: 4
ISSN: 0734-2101
Subject Category
INORGANIC AND PHYSICAL CHEMISTRY
Funding Number(s)
CONTRACT_GRANT: NCC2-63
Distribution Limits
Public
Copyright
Other