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Amorphous Insulator Films With Controllable PropertiesIn experiments described in report, amorphous hydrogenated carbon films grown at room temperature by low-frequency plasma deposition, using methane or butane gas. Films have unique array of useful properties; (a) adhere to wide variety of materials; (b) contain only carbon and hydrogen; (c) smooth and free of pinholes; (d) resistant to attack by moisture and chemicals; and (e) have high electric-breakdown strength and electrical resistivity. Two of optical properties and hardness of this film controlled by deposition conditions. Amorphous a-C:H and BN films used for hermetic sealing and protection of optical, electronic, magnetic, or delicate mechanical systems, and for semiconductor field dielectrics.
Document ID
19870000469
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Alterovitz, Samuel A.
(NASA Lewis Research Center, Cleveland, Ohio.)
Warner, Joseph D.
(NASA Lewis Research Center, Cleveland, Ohio.)
Liu, David C.
(NASA Lewis Research Center, Cleveland, Ohio.)
Pouch, John J.
(NASA Lewis Research Center, Cleveland, Ohio.)
Date Acquired
August 13, 2013
Publication Date
October 1, 1987
Publication Information
Publication: NASA Tech Briefs
Volume: 11
Issue: 9
ISSN: 0145-319X
Subject Category
Materials
Report/Patent Number
LEW-14370
Accession Number
87B10469
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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