A method to eliminate wetting during the homogenization of HgCdTe

Su, Ching-Hua; Lehoczky, S. L.; Szofran, F. R.

Adhesion of HgCdTe samples to fused silica ampoule walls, or 'wetting', during the homogenization process was eliminated by adopting a slower heating rate. The idea is to decrease Cd activity in the sample so as to reduce the rate of reaction between Cd and the silica wall.

Document ID

19870034626

Document Type

Reprint (Version printed in journal)

External Source(s)

doi:10.1063/1.337541

Authors

Su, Ching-Hua (NASA Marshall Space Flight Center Huntsville, AL, United States)

Lehoczky, S. L. (NASA Marshall Space Flight Center Huntsville, AL, United States)

Szofran, F. R. (NASA Marshall Space Flight Center Huntsville, AL, United States)

Date Acquired

August 13, 2013

Publication Date

November 15, 1986

Publication Information

Publication: Journal of Applied Physics

Volume: 60

ISSN: 0021-8979

Subject Category

Distribution Limits

Public

Other

NTRS

NTRS - NASA Technical Reports Server