NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Back to Results
Raman scattering from rapid thermally annealed tungsten silicideRaman scattering as a technique for studying the formation of tungsten silicide is presented. The tungsten silicide films have been formed by rapid thermal annealing of thin tungsten films sputter deposited on silicon substrates. The Raman data are interpreted by using data from resistivity measurements, Auger and Rutherford backscattering measurements, and scanning electron microscopy.
Document ID
19870044968
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Kumar, Sandeep
(Cincinnati Univ. OH, United States)
Dasgupta, Samhita
(Cincinnati Univ. OH, United States)
Jackson, Howard E.
(Cincinnati Univ. OH, United States)
Boyd, Joseph T.
(Cincinnati, University OH, United States)
Date Acquired
August 13, 2013
Publication Date
February 9, 1987
Publication Information
Publication: Applied Physics Letters
Volume: 50
ISSN: 0003-6951
Subject Category
Solid-State Physics
Accession Number
87A32242
Distribution Limits
Public
Copyright
Other

Available Downloads

There are no available downloads for this record.
No Preview Available