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Improved "Green" Forming Of Silicon NitrideAdvanced processing techniques reduce incidence of critical flaws. Critical flaws reduced by processing of powders to avoid organic and metallic contamination and combination of colloidal techniques with innovative slurry-pressing technique avoiding agglomeration. Silicon nitride considered for many applications ranging from components of turbine engines to industrial heat exchangers.
Document ID
19880000416
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Freedman, Marc R.
(NASA Lewis Research Center, Cleveland, Ohio.)
Sanders, William A.
(NASA Lewis Research Center, Cleveland, Ohio.)
Kiser, James D.
(NASA Lewis Research Center, Cleveland, Ohio.)
Date Acquired
August 13, 2013
Publication Date
September 1, 1988
Publication Information
Publication: NASA Tech Briefs
Volume: 12
Issue: 8
ISSN: 0145-319X
Subject Category
Materials
Report/Patent Number
LEW-14680
Accession Number
88B10416
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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