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Antireflection/Passivation Step For Silicon CellNew process excludes usual silicon oxide passivation. Changes in principal electrical parameters during two kinds of processing suggest antireflection treatment almost as effective as oxide treatment in passivating cells. Does so without disadvantages of SiOx passivation.
Document ID
19880000505
Document Type
Other - NASA Tech Brief
Authors
Crotty, Gerald T. (Caltech)
Kachare, Akaram H. (Caltech)
Daud, Taher (Caltech)
Date Acquired
August 13, 2013
Publication Date
October 1, 1988
Publication Information
Publication: NASA Tech Briefs
Volume: 12
Issue: 9
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
NPO-16810
Accession Number
88B10505
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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