Wavelength-independent anti-interference coating for the far-infrared

The transmission and reflection of radiation at an interface between two dielectrics with a thin conducting film is analyzed under conditions appropriate to the far-infrared. When the transmission is from a more dense to a less dense optical medium it is demonstrated that the reflectivity can be made arbitrarily small for a wide range of wavelengths by selecting the appropriate sheet resistance for the conducting film. This property can be exploited to produce a coating that drastically reduces the interference fringes in a flat plane-parallel dielectric substrate or window. The condition depends only on the film resistance which can be monitored precisely during deposition. This effect is demonstrated by evaporating films of nichrome on silicon substrates, which reduce the interference fringe contrast to less than 1 percent transmittance from 10-100/cm. Near the antiinterference condition the fringe contrast is shown to be a sensitive probe of the film conductivity.