Ion beam deposition of amorphous carbon films with diamond like propertiesCarbon films were deposited on silicon, quartz, and potassium bromide substrates from an ion beam. Growth rates were approximately 0.3 micron/hour. The films were featureless and amorphous and contained only carbon and hydrogen in significant amounts. The density and carbon/hydrogen ratio indicate the film is a hydrogen deficient polymer. One possible structure, consistent with the data, is a random network of methylene linkages and tetrahedrally coordinated carbon atoms.
Document ID
19880033073
Acquisition Source
Legacy CDMS
Document Type
Conference Proceedings
Authors
Angus, John C. (Case Western Reserve University Cleveland, OH, United States)
Mirtich, Michael J. (Case Western Reserve Univ. Cleveland, OH, United States)
Wintucky, Edwin G. (NASA Lewis Research Center Cleveland, OH, United States)