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Mechanical strength and tribological behavior of ion-beam-deposited boron nitride films on non-metallic substratesAn investigation was conducted to examine the mechanical strength and tribological properties of boron nitride (BN) films ion-beam deposited on silicon (Si), fused silica (SiO2), gallium arsenide (GaAs), and indium phosphide (InP) substrates in sliding contact with a diamond pin under a load. The results of the investigation indicate that BN films on nonmetallic substrates, like metal films on metallic substrates, deform elastically and plastically in the interfacial region when in contact with a diamond pin. However, unlike metal films and substrates, BN films on nonmetallic substrates can fracture when they are critically loaded. Not only does the yield pressure (hardness) of Si and SiO2 substrates increase by a factor of 2 in the presence of a BN film, but the critical load needed to fracture increases as well. The presence of films on the brittle substrates can arrest crack formation. The BN film reduces adhesion and friction in the sliding contact. BN adheres to Si and SiO2 and forms a good quality film, while it adheres poorly to GaAs and InP. The interfacial adhesive strengths were 1 GPa for a BN film on Si and appreciably higher than 1 GPa for a BN film on SiO2.
Document ID
19880045639
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Miyoshi, Kazuhisa
(NASA Lewis Research Center Cleveland, OH, United States)
Pouch, John J.
(NASA Lewis Research Center Cleveland, OH, United States)
Alterovitz, Samuel A.
(NASA Lewis Research Center Cleveland, OH, United States)
Sliney, Harold E.
(NASA Lewis Research Center Cleveland, OH, United States)
Buckley, Donald H.
(Case Western Reserve University Cleveland, OH, United States)
Date Acquired
August 13, 2013
Publication Date
January 1, 1987
Publication Information
Publication: Surface and Coatings Technology
Volume: 33
ISSN: 0257-8972
Subject Category
Nonmetallic Materials
Accession Number
88A32866
Distribution Limits
Public
Copyright
Other

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