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Models of second-order effects in metal-oxide-semiconductor field-effect transistors for computer applicationsSecond-order effects in metal-oxide-semiconductor field-effect transistors (MOSFETs) are important for devices with dimensions of 2 microns or less. The short and narrow channel effects and drain-induced barrier lowering primarily affect threshold voltage, but formulas for drain current must also take these effects into account. In addition, the drain current is sensitive to channel length modulation due to pinch-off or velocity saturation and is diminished by electron mobility degradation due to normal and lateral electric fields in the channel. A model of a MOSFET including these considerations and emphasizing charge conservation is discussed.
Document ID
19880052918
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Benumof, Reuben
(Staten Island College, NY, United States)
Zoutendyk, John
(City Univ. of New York Staten Island, NY, United States)
Coss, James
(California Institute of Technology Jet Propulsion Laboratory, Pasadena, United States)
Date Acquired
August 13, 2013
Publication Date
May 15, 1988
Publication Information
Publication: Journal of Applied Physics
Volume: 63
ISSN: 0021-8979
Subject Category
Electronics And Electrical Engineering
Accession Number
88A40145
Distribution Limits
Public
Copyright
Other

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