NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Back to Results
Effects of oxidation and roughness on Cu contact resistance from 4 to 290 KKnowledge of the factors influencing contact resistance is important for optimizing system design in cryogenic applications. In space cryogenics, indirect cooling of infrared components is the primary concern. The presence of bolted joints results in contact resistances which can dominate all other contributions to the overall heat transfer rate. Here, thermal and electrical contact resistances measured between 4 K and 290 K for a series of bolted OFHC Cu contacts are reported. Surface roughness is found to have little effect on the overall contact resistance within the experimental limits, while oxidation can increase the contact resistance by as much as a factor of 100. Thermal and electrical contact resistances measured on the same contact show that the contact resistance temperature dependence does not follow the bulk dependence. For example, the residual resistance ratio (RRR) of the OFHC Cu is 110, but for contacts made from this material, the RRR is about two.
Document ID
19880066088
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Nilles, M. J.
(Wisconsin Univ. Madison, WI, United States)
Van Sciver, S. W.
(Wisconsin, University Madison, United States)
Date Acquired
August 13, 2013
Publication Date
January 1, 1988
Subject Category
Engineering (General)
Meeting Information
Meeting: Advances in cryogenic engineering (Materials). Volume 34
Location: Saint Charles, IL
Country: United States
Start Date: June 14, 1987
End Date: June 18, 1987
Accession Number
88A53315
Funding Number(s)
CONTRACT_GRANT: NAG2-242
Distribution Limits
Public
Copyright
Other

Available Downloads

There are no available downloads for this record.
No Preview Available