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Plasma/Neutral-Beam Etching ApparatusEnergies of neutral particles controllable. Apparatus developed to produce intense beams of reactant atoms for simulating low-Earth-orbit oxygen erosion, for studying beam-gas collisions, and for etching semiconductor substrates. Neutral beam formed by neutralization and reflection of accelerated plasma on metal plate. Plasma ejected from coaxial plasma gun toward neutralizing plate, where turned into beam of atoms or molecules and aimed at substrate to be etched.
Document ID
19890000261
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Langer, William
(Princeton Univ.)
Cohen, Samuel
(Princeton Univ.)
Cuthbertson, John
(Princeton Univ.)
Manos, Dennis
(Princeton Univ.)
Motley, Robert
(Princeton Univ.)
Date Acquired
August 14, 2013
Publication Date
May 1, 1989
Publication Information
Publication: NASA Tech Briefs
Volume: 13
Issue: 5
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
MFS-26068
Accession Number
89B10261
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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