Reactions of atomic oxygen (O/3P/) with various polymer films

An attempt is made to obtain the etch rates for various polymer films exposed to O(3P) downstream from, and out of the glow of, the O2 plasma. These rates are compared with published values from the following sources: etching in the glow of an O2 plasma, the Space Shuttle STS-8 flight experiment, and beam experiments. The etch rate data for Kapton fit a logarithmic plot (with a positive slope) of the reaction probability versus O(3P) impact energy.