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Metastable defects in Be-doped Al(x)Ga(1-x)AsDeep-level transient spectroscopy has been used to study metastable defects in Be-doped Al(x)Ga(1-x)As grown by molecular-beam epitaxy. The metastability manifests itself by the appearance of different spectra depending upon whether the sample is cooled from a high temperature with zero bias or a reverse bias applied to it. The defects are found in concentrations of 10 to the 15th/cu cm in a sample doped with 10 to the 18th Be/cu cm and in much lower concentrations in a 10 to the 17th Be/cu cm sample. Isochronal annealing experiments indicate that the defect is multistable and that it is best modeled as a mobile interstitial which can reside at several sites near acceptor. The activation energies for these defects are between 0.2 and 0.5 eV above the valence band.
Document ID
19890053894
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Magno, R.
(Naval Research Lab. Washington, DC, United States)
Shelby, R.
(Naval Research Lab. Washington, DC, United States)
Kennedy, T. A.
(U.S. Navy, Naval Research Laboratory, Washington DC, United States)
Spencer, M. G.
(Howard University Washington, DC, United States)
Date Acquired
August 14, 2013
Publication Date
June 15, 1989
Publication Information
Publication: Journal of Applied Physics
Volume: 65
ISSN: 0021-8979
Subject Category
Solid-State Physics
Accession Number
89A41265
Funding Number(s)
CONTRACT_GRANT: NSF ECS-84-51522
CONTRACT_GRANT: NAG5-246
Distribution Limits
Public
Copyright
Other

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