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Surface composition of solid-rocket exhausted aluminum oxide particlesParticulate samples of aluminum oxide were collected on Teflon filters from the exhaust plume of the Space Shuttle (STS-61A, October 30, 1985) over the altitude interval 4.6-7.6 km immediately after launch. These particles were analyzed using SEM, energy-dispersive X-ray analysis, electron spectroscopy for chemical analysis, X-ray fluorescent spectroscopy, and conventional wet-chemical techniques. The samples were 0.6-1.0 percent surface-chlorided (chlorided meaning predominantly aluminum chlorides and oxychlorides, possibly including other adsorbed forms of chloride) by weight. This level of chloriding is about one-third of the amount determined previously from laboratory-prepared alumina and surface site samples of solid-rocket-produced alumina (SRPA) after both had been exposed to moist HCl vapor at temperatures down to ambient. This level is equivalent to previous laboratory results with samples exposed to moist HCl at temperatures above the boiling point of water. It is suggested that the present lower chloriding levels, determined for samples from a 'dry' Shuttle exhaust cloud, underscore the importance of a liquid water/hydrochloric acid phase in governing the extent of surface chloriding of SRPA. The reduced chloriding is not trivial with respect to potential physical/chemical modification of the SRPA particle surfaces and their corresponding interaction with the atmosphere.
Document ID
19900029310
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Cofer, Wesley R., III
(NASA Langley Research Center Hampton, VA, United States)
Winstead, Edward L.
(ST Systems Corp. Hampton, VA, United States)
Key, Lawrence E.
(USAF, Engineering and Services Center Tyndall AFB, FL, United States)
Date Acquired
August 14, 2013
Publication Date
December 1, 1989
Publication Information
Publication: Journal of Propulsion and Power
Volume: 5
ISSN: 0748-4658
Subject Category
Environment Pollution
Accession Number
90A16365
Distribution Limits
Public
Copyright
Other

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