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Vacuum ultraviolet thin films. I - Optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 thin films. II - Vacuum ultraviolet all-dielectric narrowband filtersAn iteration process matching calculated and measured reflectance and transmittance values in the 120-230 nm VUV region is presently used to ascertain the optical constants of bulk MgF2, as well as films of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 deposited on MgF2 substrates. In the second part of this work, a design concept is demonstrated for two filters, employing rapidly changing extinction coefficients, centered at 135 nm for BaF2 and 141 nm for SiO2. These filters are shown to yield excellent narrowband spectral performance in combination with narrowband reflection filters.
Document ID
19910027000
Document Type
Reprint (Version printed in journal)
Authors
Zukic, Muamer
(Alabama Univ. Huntsville, AL, United States)
Torr, Douglas G.
(Alabama, University Huntsville, United States)
Spann, James F.
(Alabama Univ. Huntsville, AL, United States)
Torr, Marsha R.
(NASA Marshall Space Flight Center Huntsville, AL, United States)
Date Acquired
August 14, 2013
Publication Date
October 1, 1990
Publication Information
Publication: Applied Optics
Volume: 29
ISSN: 0003-6935
Subject Category
Optics
Accession Number
91A11623
Funding Number(s)
CONTRACT_GRANT: NAG8-639
CONTRACT_GRANT: NAG8-86
CONTRACT_GRANT: NAS8-37586
CONTRACT_GRANT: NAS8-37576
Distribution Limits
Public
Copyright
Other

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