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Contamination monitoring approaches for EUV space opticsData from contaminant-induced UV optics degradation studies and particulate models are used here to develop end-of-service-life instrument contamination requirements which are very stringent but achievable. The budget is divided into allocations for each phase of hardware processing. Optical and nonoptical hardware are monitored for particulate and molecular contamination during initial cleaning and baking, assembly, test, and calibration phases. The measured contamination levels are compared to the requirements developed for each phase to provide confidence that the required end-of-life levels will be met.
Document ID
19910035626
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Ray, David C.
(California Univ. Berkeley, CA, United States)
Malina, Roger F.
(California Univ. Berkeley, CA, United States)
Welsh, Barry J.
(California Univ. Berkeley, CA, United States)
Battel, Steven J.
(California, University Berkeley, United States)
Date Acquired
August 15, 2013
Publication Date
January 1, 1989
Subject Category
Optics
Accession Number
91A20249
Funding Number(s)
CONTRACT_GRANT: NAS5-29298
Distribution Limits
Public
Copyright
Other

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