MOCVD manifold switching effects on growth and characterization

A combined modeling and experimental approach is used to quantify the effects of various manifold components on the switching speed in metalorganic chemical vapor deposition (MOCVD). In particular, two alternative vent-run high-speed switching manifold designs suitable for either continuous or interrupted growth have been investigated. Both designs are incorporated in a common manifold, instrumented with a mass spectrometer. The experiments have been performed using nitrogen as the transport gas and argon as the simulated source gas. The advantages and limitations of two designs are discussed. It is found that while constant flow manifold switching systems may have fluid dynamic advantages, care must be taken to minimize sections of the supply manifold with low flow rates if rapid changes in alloy composition are required.