NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Back to Results
Vapor Deposition Of Metal From Gas/Tungsten ArcVacuum gas/tungsten-arc vapor-deposition process yields highly reflective, smooth films reproducing contours of surfaces on which deposited. Rate of deposition controlled precisely, and surface texture varied. Capable of deposition at rates double those of standard sputtering. Useful in making thin metallic coats to serve as electrical conductors, radio reflectors or antenna elements, or optical mirrors of partial or ultrahigh reflectivity, and in making semiconductor devices.
Document ID
19920000381
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Weeks, Jack L.
(Rockwell International Corp.)
Poorman, Richard M.
(Rockwell International Corp.)
Date Acquired
August 15, 2013
Publication Date
June 1, 1992
Publication Information
Publication: NASA Tech Briefs
Volume: 16
Issue: 6
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
MFS-29797
Accession Number
92B10381
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

Available Downloads

There are no available downloads for this record.
No Preview Available