NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Collections About News Help Login
Back to Results
Thermal expansion behavior of NiSi/NiSi2The thermal expansion of NiSi/NiSi2 for a range of temperatures from 293 to 1223 K was determined using high-temperature X-ray diffraction. While a linear relation with temperature was found for the lattice parameter of NiSi2, third-order relationships were found for the three lattice parameters of NiSi, with one of the parameters showing a decrease with increasing temperature. The volumetric expansion of both materials exhibited linear relationships.
Document ID
19920036067
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
doi:10.1016/0956-716X(92)90374-N
Authors
Wilson, D. F. (Oak Ridge National Lab. TN, United States)
Cavin, O. B. (Oak Ridge National Laboratory TN, United States)
Date Acquired
August 15, 2013
Publication Date
January 1, 1992
Publication Information
Publication: Scripta Metallurgica et Materialia
Volume: 26
ISSN: 0956-716X
Subject Category
Nonmetallic Materials
Accession Number
92A18691
Funding Number(s)
CONTRACT_GRANT: NASA ORDER C-3003-J
CONTRACT_GRANT: DE-AC05-84OR-21400
Distribution Limits
Public
Copyright
Other

Available Downloads

There are no available downloads for this record.

Related Records

There are no records associated with this record.
No Preview Available