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X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography; Proceedings of the Meeting, San Diego, CA, July 9-13, 1990Topics discussed in this issue include the fabrication of multilayer X-ray/EUV coatings; the design, characterization, and test of multilayer X-ray/EUV coatings; multilayer X-ray/EUV monochromators and imaging microscopes; X-ray/EUV telescopes; the test and calibration performance of X-ray/EUV instruments; XUV/soft X-ray projection lithography; X-ray/EUV space observatories and missions; X-ray/EUV telescopes for solar research; X-ray/EUV polarimetry; X-ray/EUV spectrographs; and X-ray/EUV filters and gratings. Papers are presented on the deposition-controlled uniformity of multilayer mirrors, interfaces in Mo/Si multilayers, the design and analysis of an aspherical multilayer imaging X-ray microscope, recent developments in the production of thin X-ray reflecting foils, and the ultraprecise scanning technology. Consideration is also given to an active sun telescope array, the fabrication and performance at 1.33 nm of a 0.24-micron-period multilayer grating, a cylindrical proportional counter for X-ray polarimetry, and the design and analysis of the reflection grating arrays for the X-Ray Multi-Mirror Mission.
Document ID
19920042577
Acquisition Source
Legacy CDMS
Document Type
Conference Proceedings
Authors
Hoover, Richard B.
(NASA Marshall Space Flight Center Huntsville, AL, United States)
Walker, Arthur B. C., Jr.
(Stanford University CA, United States)
Date Acquired
August 15, 2013
Publication Date
January 1, 1991
Publication Information
ISBN: 0-8194-0404-7
Subject Category
Optics
Report/Patent Number
SPIE-1343
Meeting Information
Meeting: X-ray/EUV Optics for Astronomy, Microscopy, Polarimetry and Projection Lithography
Location: San Diego, CA
Country: United States
Start Date: July 9, 1990
End Date: July 13, 1990
Accession Number
92A25201
Distribution Limits
Public
Copyright
Other

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