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High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering systemAttention is given to an opposed cathode sputtering system constructed with the ability to coat parts with a size up to 15 cm in diameter and 30 cm in length. Initial trials with this system revealed very low substrate bias currents. When the AlNiCo magnets in the two opposed cathodes were arranged in a mirrored configuration, the plasma density at the substrate was low, and the substrate bias current density was less than 1 mA/sq cm. If the magnets were arranged in a closed-field configuration where the field lines from one set of magnets were coupled with the other set, the substrate bias current density was as high as 5.7 mA/sq cm when NdFeB magnets were used. In the closed-field configuration, the substrate bias current density was related to the magnetic field strength between the two cathodes and to the sputtering pressure. Hard well-adhered TiN coatings were reactively sputtered in the opposed cathode system in the closed-field configuration, but the mirrored configuration produced films with poor adhesion because of etching problems and low plasma density at the substrate.
Document ID
19920049765
Document Type
Conference Paper
Authors
Sproul, William D. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Rudnik, Paul J. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Graham, Michael E. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Rohde, Suzanne L. (Northwestern University Evanston, IL, United States)
Date Acquired
August 15, 2013
Publication Date
January 1, 1990
Subject Category
INORGANIC AND PHYSICAL CHEMISTRY
Meeting Information
International Conference on Metallurgical Coatings(San Diego, CA)
Funding Number(s)
CONTRACT_GRANT: NAS8-37686
Distribution Limits
Public
Copyright
Other