NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Collections About News Help Login
Back to Results
Applied Magnetic Field Enhances Arc Vapor DepositionApplied magnetic field enhances performance of vaporization part of arc vapor deposition apparatus. When no magnetic field applied by external means, arc wonders semirandomly over cathode, with net motion toward electrical feedthrough. When magnetic field applied arc moves circumferentially around cathode, and downward motion suppressed.
Document ID
19930000170
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Miller, T. A. (Materials and Electrochemical Research Corp.)
Loutfy, R. O. (Materials and Electrochemical Research Corp.)
Withers, J. C. (Materials and Electrochemical Research Corp.)
Date Acquired
August 16, 2013
Publication Date
March 1, 1993
Publication Information
Publication: NASA Tech Briefs
Volume: 17
Issue: 3
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
MFS-26181
Accession Number
93B10170
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

Available Downloads

There are no available downloads for this record.

Related Records

There are no records associated with this record.
No Preview Available