Microstrip proportional counter development at MSFCMicrostrip detectors are an exciting new development in proportional counter design fabricated using integrated circuit-type photolithography techniques; they therefore offer very high spatial accuracy and uniformity. A development program is underway at NASA-Marshall to produce large-area microstrips for use in an X-ray detector balloon flight program and to investigate the general performance limits of these new devices. Microstrips tested so far have been fabricated both in-house using standard photolithographic techniques and by an outside contractor using electron beam technology. Various substrate materials have been tested along with different electrode configurations. The distributions of pickup on subdivided cathodes on both top and bottom surfaces of the microstrips are also being investigated for use as two-dimensional imaging detectors. Data from these tests in the development of a large-area device will be presented.
Document ID
19930045491
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Fulton, M. A. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Kolodziejczak, J. J. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Ramsey, B. D. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Date Acquired
August 16, 2013
Publication Date
January 1, 1992
Publication Information
Publication: In: EUV, X-ray, and gamma-ray instrumentation for astronomy III; Proceedings of the Meeting, San Diego, CA, July 22-24, 1992 (A93-29476 10-35)
Publisher: Society of Photo-Optical Instrumentation Engineers