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phase holograms in polymethyl methacrylateA procedure is described for the fabrication of complex computer-generated phase holograms in polymethyl methacrylate (PMMA) by means of partial-exposure e-beam lithography and subsequent carefully controlled partial development. Following the development, the pattern appears (rendered in relief) in the PMMA, which then acts as the phase-delay medium. The devices fabricated were designed with 16 equal phase steps per retardation cycle, were up to 3 mm square, and consisted of up to 10 millions of 0.3-2.0-micron square pixels. Data files were up to 60 Mb-long, and the exposure times ranged to several hours. A Fresnel phase lens was fabricated with a diffraction-limited optical performance of 83-percent efficiency.
Document ID
19930054471
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Maker, P. D.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Muller, R. E.
(JPL Pasadena, CA, United States)
Date Acquired
August 16, 2013
Publication Date
December 1, 1992
Publication Information
Publication: Journal of Vacuum Science and Technology B
Volume: 10
Issue: 6
ISSN: 0734-211X
Subject Category
NONMETALLIC MATERIALS
Distribution Limits
Public
Copyright
Other