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Multilayer diffraction at 104 keVWe have measured the diffraction peak of a W:Si synthetic multilayer reflector at 104 keV using the High Energy Bonse-Hart Camera at the X-17B hard X-ray wiggler beam line of the National Synchrotron Light Source at Brookhaven National Laboratory. The characteristics of the diffraction peak are described and compared to theory.
Document ID
19930055634
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Krieger, Allen S. (Radiation Science, Inc. Belmont, MA, United States)
Blake, Richard L. (Los Alamos National Lab. NM, United States)
Siddons, D. P. (Brookhaven National Lab. Upton, NY, United States)
Date Acquired
August 16, 2013
Publication Date
January 1, 1993
Publication Information
Publication: In: Multilayer and grazing incidence X-ray(EUV optics for astronomy and projection lithography; Proceedings of the Meeting, San Diego, CA, July 19-22, 1992 (A93-39601 15-74)
Publisher: Society of Photo-Optical Instrumentation Engineers
Subject Category
Nuclear And High-Energy Physics
Accession Number
93A39631
Funding Number(s)
CONTRACT_GRANT: NASW-4427
Distribution Limits
Public
Copyright
Other

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IDRelationTitle19930055604Collected WorksMultilayer and grazing incidence X-ray/EUV optics for astronomy and projection lithography; Proceedings of the Meeting, San Diego, CA, July 19-22, 1992
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