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High reflectance coatings for space applications in the EUVAdvances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency and made possible to consider more complex optical designs in the EUV. The importance of recent developments in chemical vapor deposited silicon carbide (CVD-SiC), SiC films and multilayer coatings is discussed in the context of EUV instrumentation design. The EUV performance of these coatings as well as some strengths and problem areas for their use in space will be addressed.
Document ID
19930055640
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Keski-Kuha, Ritva A. M. (NASA Goddard Space Flight Center Greenbelt, MD, United States)
Gum, Jeffrey S. (NASA Goddard Space Flight Center Greenbelt, MD, United States)
Osantowski, John F. (NASA Goddard Space Flight Center Greenbelt, MD, United States)
Fleetwood, Charles M. (NASA Goddard Space Flight Center Greenbelt, MD, United States)
Date Acquired
August 16, 2013
Publication Date
January 1, 1993
Publication Information
Publication: In: Multilayer and grazing incidence X-ray(EUV optics for astronomy and projection lithography; Proceedings of the Meeting, San Diego, CA, July 19-22, 1992 (A93-39601 15-74)
Publisher: Society of Photo-Optical Instrumentation Engineers
Subject Category
Optics
Accession Number
93A39637
Distribution Limits
Public
Copyright
Other

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IDRelationTitle19930055604Collected WorksMultilayer and grazing incidence X-ray/EUV optics for astronomy and projection lithography; Proceedings of the Meeting, San Diego, CA, July 19-22, 1992
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