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Continued improvment of large area, in situ sputter deposition of superconducting YBCO thin filmsThe deposition of thin films of superconducting YBa2Cu3O7-x onto substrates of up to 3-in diameter by an integrated off-axis sputtering is reported. The substrate is located above the center of an 8-in-diameter YBCO planar target, and, in conjunction with a negative ion shield, negative ion effects are avoided. A large radiant heater provides backside, noncontact heating of the bare substrates. YBCO films have been grown on polished 1-cm2 MgO and LaAlO3 substrates with Tc = 90 K or greater, Jc = 2.5 x 10 exp 6 A/sq cm or greater at 77 K, and microwave surface resistance Rs less than 0.4 micro-ohm at 77 K and 10 GHz. The films have a very smooth surface morphology. Uniformity data for LaAlO3 substrates are less than +/-5 percent in Rs. Thickness uniformity results for 3-in substrates indicate less than 10 percent variation. The growth of epitaxial insulating films for use with YBCO films and application of the YBCO films in microwave devices are briefly discussed.
Document ID
19930060601
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Truman, J. K.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
White, W. R.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Ballentine, P. H.
(CVC Products, Inc. Rochester, NY, United States)
Mallory, D. S.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Kadin, A. M.
(Rochester Univ. NY, United States)
Date Acquired
August 16, 2013
Publication Date
March 1, 1993
Publication Information
Publication: IEEE Transactions on Applied Superconductivity
Volume: 3
Issue: 1, pt
ISSN: 1051-8223
Subject Category
Solid-State Physics
Accession Number
93A44598
Distribution Limits
Public
Copyright
Other

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