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Record 1 of 1112
Electron cyclotron resonance microwave plasma deposition of a-Si:H and a-SiC:H films
External Online Source: doi:10.1016/0379-6787(91)90072-W
Author and Affiliation:
Shing, Y. H.(Jet Propulsion Lab., California Inst. of Tech., Pasadena, CA, United States)
Pool, F. S.(JPL, Pasadena, CA, United States)
Abstract: The paper reports electron cyclotron resonance (ECR) deposition of a-Si:H and a-SiC:H thin films using SiH4, CH4, and hydrogen mixed gas plasmas. The ECR deposition conditions were investigated in the pressure region of 0.1 to 100 mtorr, and the film properties were characterized by light and dark conductivity measurements, XRD, Raman spectroscopy, optical transmission, and IR spectroscopy. In addition, the hydrogen dilution effect on ECR-deposited a-SiC:H was investigated.
Publication Date: Jan 01, 1991
Document ID:
19930066497
(Acquired Dec 28, 1995)
Accession Number: 93A50494
Subject Category: SOLID-STATE PHYSICS
Document Type: Journal Article
Publication Information: Solar Cells (ISSN 0379-6787); p. 391-401.
Publisher Information: Switzerland
Financial Sponsor: NASA; United States
Organization Source: Jet Propulsion Lab., California Inst. of Tech.; Pasadena, CA, United States
Description: 11p; In English
Distribution Limits: Unclassified; Publicly available; Unlimited
Rights: Copyright
NASA Terms: CYCLOTRON RESONANCE; PLASMA SPRAYING; RADIO FREQUENCY DISCHARGE; SILANES; SILICON CARBIDES; THIN FILMS; GLOW DISCHARGES; INFRARED ABSORPTION; INFRARED SPECTROSCOPY; METHANE; RAMAN SPECTRA; X RAY DIFFRACTION
Imprint And Other Notes: Solar Cells vol. 30 p. 391-401. 1991
Miscellaneous Notes: Research sponsored by DOE
Availability Source: Other Sources
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