NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Back to Results
Electron cyclotron resonance microwave plasma deposition of a-Si:H and a-SiC:H filmsThe paper reports electron cyclotron resonance (ECR) deposition of a-Si:H and a-SiC:H thin films using SiH4, CH4, and hydrogen mixed gas plasmas. The ECR deposition conditions were investigated in the pressure region of 0.1 to 100 mtorr, and the film properties were characterized by light and dark conductivity measurements, XRD, Raman spectroscopy, optical transmission, and IR spectroscopy. In addition, the hydrogen dilution effect on ECR-deposited a-SiC:H was investigated.
Document ID
19930066497
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Shing, Y. H.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Pool, F. S.
(JPL Pasadena, CA, United States)
Date Acquired
August 16, 2013
Publication Date
January 1, 1991
Publication Information
Publication: Solar Cells
ISSN: 0379-6787
Subject Category
Solid-State Physics
Accession Number
93A50494
Distribution Limits
Public
Copyright
Other

Available Downloads

There are no available downloads for this record.
No Preview Available