NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Back to Results
Characterizing SOI Wafers By Use Of AOTF-PHIDevelopmental nondestructive method of characterizing layers of silicon-on-insulator (SOI) wafer involves combination of polarimetric hyperspectral imaging by use of acousto-optical tunable filters (AOTF-PHI) and computational resources for extracting pertinent data on SOI wafers from polarimetric hyperspectral images. Offers high spectral resolution and both ease and rapidity of optical-wavelength tuning. Further efforts to implement all of processing of polarimetric spectral image data in special-purpose hardware for sake of procesing speed. Enables characterization of SOI wafers in real time for online monitoring and adjustment of production. Also accelerates application of AOTF-PHI to other applications in which need for high-resolution spectral imaging, both with and without polarimetry.
Document ID
19950065423
Document Type
Other - NASA Tech Brief
Authors
Cheng, Li-Jen (Caltech)
Li, Guann-Pyng (California Univ.)
Zang, Deyu (Metro Laser, Inc.)
Date Acquired
August 17, 2013
Publication Date
June 1, 1995
Publication Information
Publication: NASA Tech Briefs
Volume: 19
Issue: 6
ISSN: 0145-319X
Subject Category
PHYSICAL SCIENCES
Report/Patent Number
NPO-19445
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.