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The effect of heat treatment on the magnitude and composition of residual gas in sealed silica glass ampoulesThe residual gas pressure and composition in sealed silica glass ampoules as a function of different treatment procedures has been investigated. The dependence of the residual gas on the outgassing and annealing parameters has been determined. The effects of the fused silica brand, of the ampoule fabrication, and of post-outgassing procedures have been evaluated.
Document ID
19970008016
Document Type
Reprint (Version printed in journal)
Authors
Palosz, W. (NASA Marshall Space Flight Center Huntsville, AL United States)
Szofran, F. R. (NASA Marshall Space Flight Center Huntsville, AL United States)
Lehoczky, S. L. (NASA Marshall Space Flight Center Huntsville, AL United States)
Date Acquired
August 17, 2013
Publication Date
January 1, 1994
Publication Information
Publication: Journal of Crystal Growth
Issue: 142
ISSN: 0022-0248
Subject Category
Solid-State Physics
Report/Patent Number
NAS 1.15:112124
NASA TM-112124
Distribution Limits
Public
Copyright
Public Use Permitted.
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