The effect of heat treatment on the magnitude and composition of residual gas in sealed silica glass ampoules

Palosz, W.; Szofran, F. R.; Lehoczky, S. L.

The residual gas pressure and composition in sealed silica glass ampoules as a function of different treatment procedures has been investigated. The dependence of the residual gas on the outgassing and annealing parameters has been determined. The effects of the fused silica brand, of the ampoule fabrication, and of post-outgassing procedures have been evaluated.

Document ID

19970008016

Document Type

Reprint (Version printed in journal)

External Source(s)

doi:10.1016/0022-0248(94)90290-9

Authors

Palosz, W. (NASA Marshall Space Flight Center Huntsville, AL United States)

Szofran, F. R. (NASA Marshall Space Flight Center Huntsville, AL United States)

Lehoczky, S. L. (NASA Marshall Space Flight Center Huntsville, AL United States)

Date Acquired

August 17, 2013

Publication Date

January 1, 1994

Publication Information

Publication: Journal of Crystal Growth

Issue: 142

ISSN: 0022-0248

Subject Category

Report/Patent Number

Distribution Limits

Public

Public Use Permitted.

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