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An Effective Secondary Electron Emission Suppression Treatment For Copper MDCUntreated oxygen-free, high-conductivity (OFHC) copper, commonly used for MDC electrodes, exhibits relatively high secondary electron emission characteristics. This paper describes a specialized ion-bombardment procedure for texturing copper surfaces which sharply reduces the emission properties relative to untreated copper. The resulting surface is a particle-free, robust, uniformly highly-textured all-metal structure. The use of this process requires no modifications to copper machining, brazing, or other MDC normal fabrication procedures. The flight TWT for a planned NASA deep space probe, the Cassini Mission, will incorporate copper MDC electrodes treated with the method described here.
Document ID
19970011907
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Curren, Arthur N.
(NASA Lewis Research Center Cleveland, OH United States)
Long, Kenwyn J.
(NASA Lewis Research Center Cleveland, OH United States)
Jensen, Kenneth A.
(NASA Lewis Research Center Cleveland, OH United States)
Roman, Robert F.
(NASA Lewis Research Center Cleveland, OH United States)
Date Acquired
August 17, 2013
Publication Date
December 8, 1993
Publication Information
Publisher: Institute of Electrical and Electronics Engineers
ISBN: 0-7803-1450-6
Subject Category
Electronics And Electrical Engineering
Report/Patent Number
NASA-TM-112347
NAS 1.15:112347
IEDM-93-777
Meeting Information
Meeting: International Electron Devices Meeting
Location: Washington, DC
Country: United States
Start Date: December 5, 1993
End Date: December 8, 1993
Sponsors: Institute of Electrical and Electronics Engineers
Accession Number
97N70865
Distribution Limits
Public
Copyright
Public Use Permitted.
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