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1.54 micron Emission from Erbium implanted GaN for Photonic ApplicationsThe development of efficient and compact light sources operating at 1.54 micron is of enormous importance for the advancement of new optical communication systems. Erbium (1%) doped fiber amplifiers (EDFA's) or semiconductor lasers are currently being employed as near infrared light sources. Both devices, however, have inherent limitations due to their mode of operation. EDFA's employ an elaborate optical pumping scheme, whereas diode lasers have a strongly temperature dependent lasing wavelength. Novel light emitters based on erbium doped III-V semiconductors could overcome these limitations. Er doped semiconductors combine the convenience of electrical excitation with the excellent luminescence properties of Er(3+) ions. Electrically pumped, compact, and temperature stable optoelectronic devices are envisioned from this new class of luminescent materials. In this paper we discuss the potential of Er doped GaN for optoelectronic applications based on temperature dependent photoluminescence excitation studies.
Document ID
20000032240
Acquisition Source
Langley Research Center
Document Type
Conference Paper
Authors
Thaik, Myo
(Hampton Inst. VA United States)
Hommerich, U.
(Hampton Inst. VA United States)
Schwartz, R. N.
(Hughes Research Labs. Malibu, CA United States)
Wilson, R. G.
(Hughes Research Labs. Malibu, CA United States)
Zavada, J. M.
(Army Research Office Research Triangle Park, NC United States)
Date Acquired
August 19, 2013
Publication Date
February 22, 1998
Publication Information
Publication: NASA University Research Centers Technical Advances in Aeronautics, Space Sciences and Technology, Earth Systems Sciences, Global Hydrology, and Education
Volume: 2 and 3
Subject Category
Solid-State Physics
Funding Number(s)
CONTRACT_GRANT: DAAH04-96-I-0089
CONTRACT_GRANT: NCC1-251
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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