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Plasma Processing of Metallic and Semiconductor Thin Films in the Fisk Plasma SourceThe use of plasmas to process materials has become widespread throughout the semiconductor industry. Plasmas are used to modify the morphology and chemistry of surfaces. We report on initial plasma processing experiments using the Fisk Plasma Source. Metallic and semiconductor thin films deposited on a silicon substrate have been exposed to argon plasmas. Results of microscopy and chemical analyses of processed materials are presented.
Document ID
Document Type
Conference Paper
Lampkin, Gregory
(Fisk Univ. Nashville,TN United States)
Thomas, Edward, Jr.
(Fisk Univ. Nashville,TN United States)
Watson, Michael
(Fisk Univ. Nashville,TN United States)
Wallace, Kent
(Fisk Univ. Nashville,TN United States)
Chen, Henry
(Fisk Univ. Nashville,TN United States)
Burger, Arnold
(Fisk Univ. Nashville,TN United States)
Date Acquired
August 19, 2013
Publication Date
February 22, 1998
Publication Information
Publication: NASA University Research Centers Technical Advances in Aeronautics, Space Sciences and Technology, Earth Systems Sciences, Global Hydrology, and Education
Volume: 2 and 3
Subject Category
Plasma Physics
Report/Patent Number
Funding Number(s)
Distribution Limits
Work of the US Gov. Public Use Permitted.
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