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Thin and Thick Films Materials Based Interconnection Technology for 500 C OperationPrecious metal based thick-film material was used for printed wires, wire bond pads, test lead-attach, and conductive die-attach for high temperature (up to 500 C and beyond) chip level packaging. A SiC Shottky diode with a thin-film coated backside was attached to a ceramic substrate using precious metal based thick-film material as the electrically conductive bonding layer. After a 500-hour soak test in atmospheric oxygen, these basic interconnection elements, including attached test diode survived both electrically and mechanically. The electrical resistance of these interconnections (including thick-film printed wire/pad, bonded wire, and test lead attach) were low and stable at both room and elevated temperatures. The electrical resistance of the die-attach interface estimated by I-V characterization of the attached diode, during and after high temperature heat treatment, remained desirably low over the course of a 500-hour anneal. Further durability testing of this high temperature interconnection technology is also discussed.
Document ID
20000083956
Acquisition Source
Glenn Research Center
Document Type
Preprint (Draft being sent to journal)
Authors
Chen, Liang-Yu
(AYT Corp. Brook Park, OH United States)
Hunter, Gary W.
(NASA Glenn Research Center Cleveland, OH United States)
Neudeck, Philip G.
(NASA Glenn Research Center Cleveland, OH United States)
Date Acquired
September 7, 2013
Publication Date
August 1, 2000
Subject Category
Electronics And Electrical Engineering
Report/Patent Number
E-12188
NASA/TM-2000-209940
NAS 1.15:209940
Meeting Information
Meeting: First International Conference on Microelectronics and Interfaces
Location: Santa Clara, CA
Country: United States
Start Date: February 7, 2000
End Date: February 11, 2000
Sponsors: American Vacuum Society
Funding Number(s)
CONTRACT_GRANT: NAS3-27571
PROJECT: RTOP 242-90-0C
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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