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Theoretical Study of Indium Compounds of Interest for Organometallic Chemical Vapor DepositionThe structural. electronic and therinochemical properties of indium compounds which are of interest in halide transport and organometallic chemical vapor deposition processes have been studied by ab initio and statistical mechanics methods. The compounds reported include: indium halides and hydrides (InF, InCl, InCl3, InH, InH2, InH3); indium clusters (In2, In3); methylindium, dimethylindium, and their hydrogen derivatives [In(CH3), In(CH3)H, In(CH3)H2, In(CH3)2, In(CH3)2H]; dimethyl-indium dimer [In2(CH3)4], trimethyl-indium [In(CH3)3]; dehydrogenated methyl, dimethyl and trimethylindium [In(CH3)2CH2, In(CH3)CH2, In(CH2)], trimethylindium adducts with ammonia, trimethylamine and hydrazine [(CH3)3In:NH3, (CH3)3In:N(CH3)3, (CH3)3In:N(H2)N(H2)]; dimethylamino-indium and methylimino-indium [In(CH3)2(NH2), In(CH3)(NH)]; indium nitride and indium nitride dimer (InN, In2N2), indium phosphide, arsenide and antimonide ([InP, InAs, InSb). The predicted electronic properties are based on density functional theory calculations; the calculated thermodynamic properties are reported following the format of the JANAF (Joint Army, Navy, NASA, Air Force) Tables. Equilibrium compositions at two temperatures (298 and 1000 K) have been analyzed for groups of competing simultaneous reactions.
Document ID
20000093800
Document Type
Preprint (Draft being sent to journal)
Authors
Cardelino, B. H. (Spelman Coll. Atlanta, GA United States)
Moore, C. E. (NASA Marshall Space Flight Center Huntsville, AL United States)
Cardelino, C. A. (Georgia Inst. of Tech. Atlanta, GA United States)
Frazier, D. O. (NASA Marshall Space Flight Center Huntsville, AL United States)
Backmann, K. J. (North Carolina State Univ. Raleigh, NC United States)
Date Acquired
August 19, 2013
Publication Date
January 1, 2000
Subject Category
Inorganic, Organic and Physical Chemistry
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.