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Langmuir Probe Measurements of Inductively Coupled CHF3/Ar and Ar/CHF3/O2 PlasmasPlasma parameters, such as, electron number density (ne), electron temperature (Te), y electron energy distribution function (EEDF), mean electron energy (Ee), ion number density (ni), and plasma potential (Vp), have been measured by using Langmuir probe in low-pressure (10-50 mTorr) inductively coupled CHF3/Ar and CHF3/Ar/O2 plasmas generated in the GEC cell. The measurements were made at the center of the plasma, keeping the lower electrode grounded, for various CHF3/Ar and Ar/CHF3/O2 mixtures operating at 10-50 mTorr pressures and two input RF power levels, 200 and 300 W. EEDF data show a strong Druyvesteyn distribution with relatively lower number of low energy electrons as compared to a Maxwell distribution and a large electron population with energies higher than the plasma potential. The results further show that at low CHF3 concentrations (less than 50%) the electron number density remains nearly constant with increase in pressure. At higher CHF3 concentrations, however, it decreases with increase in pressure. Plasma potential and electron temperature increase with decrease in pressure and with increase in CHF3 concentration. An analysis of the above observations and mechanisms will be presented.
Document ID
20010089868
Acquisition Source
Ames Research Center
Document Type
Conference Paper
Authors
Sharma, S. P.
(NASA Ames Research Center Moffett Field, CA United States)
Rao, M. V. V. S.
(Eloret Corp. United States)
Meyyappan, M.
(NASA Ames Research Center Moffett Field, CA United States)
Date Acquired
August 20, 2013
Publication Date
January 5, 2000
Subject Category
Plasma Physics
Meeting Information
Meeting: 53rd Gaseous Electronics Conference
Location: Houston, TX
Country: United States
Start Date: November 24, 2000
End Date: November 27, 2000
Funding Number(s)
PROJECT: RTOP 632-10-01
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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