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Fabrication of Genesis Sample Simulants Using Plasma Source Ion Implantation (PSII)Plasma source ion implantation can be used to fabricate simulant samples for the Genesis mission. These simulants will be needed by investigators to validate sample preparation and analysis techniques for the returned Genesis samples. Additional information is contained in the original extended abstract.
Document ID
20020046425
Acquisition Source
Jet Propulsion Laboratory
Document Type
Conference Paper
Authors
Kuhlman, K. R.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA United States)
Date Acquired
August 20, 2013
Publication Date
April 1, 2002
Publication Information
Publication: Lunar and Planetary Science XXXIII
Subject Category
Lunar And Planetary Science And Exploration
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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